Schematic illustration of how (a) convential patterning leads to edge placement errors, (b) area-selective ALD can be employed for self-aligned processing. Mackus et al., Chem. Mater. 2019, 31, 2−12
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Schematic illustration of how (a) convential patterning leads to edge placement errors, (b) area-selective ALD can be employed for self-aligned processing. Mackus et al., Chem. Mater. 2019, 31, 2−12
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