As will be clear from many of our posts on this blog(1, 2, 3), area-selective deposition (ASD) is currently an extremely hot research topic. This is mainly because of its potential application in future nanoelectronics as a solution to the
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In situ spectroscopic ellipsometry and ALD
– How ellipsometry became a popular technique to monitor ALD film growth
Serendipity is often cited as a key factor in scientific innovations. I can fully confirm this as will also be obvious from the subtitle of this blog site: “Blog about strategy, serendipity and vision in nanoscience”. From my point of
Uniform or Area-Selective ALD of In2O3:H?
– It’s all about nucleation
A little while ago I wrote a blog about my PhD project. In this blog, I explained that most of my PhD project revolved around an atomic layer deposition (ALD) process that I developed to make hydrogen-doped indium oxide (In2O3:H):
New developments in area selective deposition
– Take-home messages from the 2nd Area Selective Deposition workshop (ASD2017)
As announced in our previous blog post on the 2nd area selective deposition (ASD2017) workshop, this post will highlight the new developments in the field of ASD. I will summarize my take-home messages from the workshop by discussing three topics
The solar-powered family car Stella Vie
– a closer look at the solar cells
On June 21, the Solar Team Eindhoven launched its 5-person, solar-powered family car “Stella Vie”. The car, which has been developed by students at the Eindhoven University of Technology (TU/e), will take part in the cruiser class event of the
The dawn of atomic-scale processing
– The growing importance of atomic layer deposition and etching
A few weeks ago, the big news was that the research alliance of IBM, Global Foundries and Samsung unveiled the world’s first 5 nm chip as we could all read everywhere over the internet [1]. Most notable was however the
Atomic layer deposition for device integration of graphene
– A just published review paper
A new paper from our group has just appeared in Advanced Material Interfaces. In this paper I – together with my colleagues, have reviewed the methods explored to achieve uniform atomic layer deposition (ALD) on graphene. The work is part
2nd Area-selective deposition workshop (ASD 2017)
– Flashback
On April 20-21, the 2nd Area Selective Deposition workshop (ASD 2017) took place in Eindhoven. Here we give a brief flashback of the workshop and include several photographs of the meeting, including a group photo of the participants. The workshop
ALD-enabled nanopatterning: area-selective ALD by area-activation
– Reflecting on ASD 2016 with the ASD 2017 workshop approaching
The 2nd Area Selective Deposition workshop (ASD 2017, link) is approaching quickly now. The workshop will take place in Eindhoven on April 21 and my colleague Adrie Mackus is the main organizer. With the upcoming workshop in mind, I thought
Join the short course on Atomic Layer Deposition!
Prof. Gregory Parsons (North Carolina State University) and Prof. Erwin Kessels (Eindhoven University of Technology) invite you to participate you in their short course on Atomic Layer Deposition (ALD), at the Eindhoven University of Technology on April 20, 2017. This