Last year we finished a project called “Taking plasma ALD to the next level” (funded by the Netherlands Organization for Scientific Research (NWO), Applied and Engineering Sciences (AES) section). This project was devoted to obtaining a better understanding of plasma
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Atomic Limits company talk: Trymax and their innovative plasma based equipment solutions
“An interview with Peter Dijkstra and Karsten Arts.” This is already the fourth post in a series of blogs in which we will share exciting information about companies or other organizations within the atomic scale processing industry. Through an interview,
After enabling AI it is time for the plasma community to benefit from AI – Personal view in a short perspective article
This blog post is about a short perspective article that I recently wrote for the ILTPC newsletter. ILTPC stands for the International Low Temperature Plasma Community. It is one of the two main communities where I feel at home. The
Atomic limits company talk: ATLANT 3D – Atomic layer processing technology
“An interview with Maksym Plakhotnyuk.” This is another post in a series of blogs in which we will share exciting information about companies or other organizations within the atomic scale processing industry. Through an interview, we aim to get insight
Plasma-Assisted Atomic Layer Deposition: Basics, Equipment, Applications – An upcoming AVS webinar – February 15, 2023
On February 15, 2023 (1:00 pm – 5:00 pm (EDT) I will give an AVS Webinar about the topic plasma-assisted ALD. I gave a similar webinar two years ago and you can read about it here as it was covered
Let’s chat GPC by chatGPT – Putting ChatGPT to the test and a first (?) article about ALD by AI
I’m sure you have heard the buzz in the field of artificial intelligence (AI)… The promise of AI is to augment human abilities in areas such as decision-making, problem-solving, and other tasks. AI systems aim to simulate human intelligence and
A review on Atomic Layer Deposition of (semi)conductive oxides – The role of ALD in these emerging materials and their applications
Quick link to open access paper: Applied Physics Reviews 9, 041313 (2022) Earlier this month I published my review paper entitled Atomic layer deposition of conductive and semiconductive oxides. It was an invited review for Applied Physics Reviews and I was
Foundations of atomic-level plasma processing in nanoelectronics – Smaller, thinner, taller, etc … all enabled by plasmas
***Quick link to the open access paper: “Foundations of atomic-level plasma processing in nanoelectronics”*** We have just published a topical review paper entitled “Foundations of atomic-level plasma processing in nanoelectronics” in the journal Plasma Sources Science and Technology. This review
AtomicLimits company talk: SparkNano and their aim to commercialize spatial ALD for the energy market
Cover image: SparkNano engineers in the lab (courtesy of TNO) An interview with Huib Heezen and Paul Poodt This is the second post in a new series of blogs in which we will share exciting information about companies or other organizations
Looking back at the Spatial ALD day -with photos and downloadable presentations!
At the start of summer we hosted the first Spatial ALD day at the Eindhoven University of Technology. In this blogpost, I want to look back at this day with a few highlights. Also, you can find photos and downloadable