Diffusion-limited growth schematic

Karsten Arts, adapted from “Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2”, J. Phys. Chem. C 123, 27030–27035 (2019). DOI: 10.1021/acs.jpcc.9b08176, CC-BY-NC-ND