The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview
Conformal deposition and gap-fill by plasma ALD – some great TEM images and recently published cover art
The ability of atomic layer deposition (ALD) to grow highly conformal thin films is one of the main reasons why ALD is so popular in research and heavily employed in the semiconductor industry.1,2 This not only holds for thermally-driven ALD.
Diving into the Fundamentals of Spatial Atomic Layer Deposition – Strengthening the S-ALD hub in Brainport region Eindhoven
On May 1st, we kicked off our new research project entitled “Spatial Atomic Layer Deposition – More Materials, More Demanding Applications” , granted by the NWO Domain Applied and Engineering Sciences. As the title suggests, the project is geared at
A new flavor of ALE – What plasmas can bring to isotropic etching (a radical approach)
Plasmas can offer more than just etching straight down. This blog post aims to show that the etching community can benefit greatly from using plasmas for new applications. Currently, in the atomic layer etching (ALE) community plasmas are often considered
Control of the ion energy during plasma-based atomic-scale processing – animation and publication on tailored waveform biasing
This post is about the value of industry-academia partnerships, and about how such collaborations can trigger new innovations. This month exactly 3 years ago, we were approached by Prodrive Technologies, a company in the Eindhoven area developing and manufacturing electronics
Introducing the AtomicLimits Image Library – finding images for re-use!
We are very happy to introduce our latest project to serve the community: the AtomicLimits Image Library! You can find this page in the menu at the top of the website. The image library is a central place where you
Visualizing the contributions of key authors to the field of ALD – Exploring newly implemented functionality of the ALD/Database
It is more than 2 years ago that Elsa Alvaro (Northwestern University Libraries) and Angel Yanguas-Gil (Argonne National Laboratory) published their research article “Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations” in PLOS ONE. This article provided
ALD in the Netherlands – Special issue of the NEVAC magazine (free): How a small country can be big in nanolayers
The Dutch Vacuum Society – or Nederlandse Vacuümvereniging (NEVAC) – publishes the so-called “NEVAC blad”, a magazine that appears three times a year. The issue for June 2020 just appeared and it is a special issue completely devoted to atomic
Atomic layer etching turns 32.5 years old! – A good occasion to share an ALE timeline and an animated version of the ALE periodic table
Last November the method of atomic layer deposition (ALD) turned 45 years old. The date of November 29, 1974 was the priority date for the first patent in the field of ALD. I considered this a good occasion to share
Atomic layer deposition turns 45! – The history of ALD in a timeline and an animated version of the ALD periodic table
Atomic layer deposition (ALD) has become a very popular method for the preparation of (ultra)thin films over the last two decades, yet it has a rich history which goes back many more years. It is well known that the first