Joost Maas

1 Articles

I'm a PhD candidate in the Plasma and Materials Processing group at the Eindhoven University of Technology (TU/e). I am investigating the fundamentals of area selective atomic layer deposition (AS-ALD) through a combination of simulations and experiments. My goal is to create a model capable of predicting inhibitor and precursor behavior.

Highlights

March 26, 2022

Launch of the ALD & ALE ReviewBase – An easy-to-access overview of all ALD and ALE review papers

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The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview