Home  /    /  Thickness control in ALD and ALE

Thickness control in ALD and ALE

Leave a Comment

Thickness control in ALD and ALE

Erwin Kessels, #ALDALE2019 – A preview of my “ALD Innovator Award” plenary presentation at the 19th International Conference on Atomic Layer Deposition, Atomic Limits (2019)

About Author

Bart Macco

I'm an assistant professor at the Eindhoven University of Technology with a passion for atomic-scale processing of semiconductor nanolayers. Moreover, I'm the person managing this blog! Hope you like it!

Leave a Reply

Our sponsors
Contact us at info@atomiclimits.com
X